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Nickel plating is available in bright, semi-bright, and microporous. EPi was the first to develop a bright single-additive nickel-plating process and perfect formulas that plate faster and thicker in the lower current densities.
4 Items
Boric acid-free high levelling bright nickel process which differentiates to electrolytes containing boric acid.
Semi-bright, sulfur-free process for duplex nickel plating. Produces less breakdown product, resulting in less carbon and low electro-negative potential.
E-Brite 757 will produce bright ductile deposits which are free from laminations. It produces brilliant, white deposits of high clarity, reflectivity and depth. The deposit is active and can be chromium plated if specified. It can be used in barrel applications as well as cathode rod and air agitated rack installations. It is a single maintenance additive.
An extremely bright, single-additive decorative process that works in both rack and barrel installations and can also be used for heavy deposit applications.
